Defect Inspection | KLA
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The Surfscan® unpatterned wafer inspection systems identify defects and surface quality issues that affect the performance and reliability of semiconductor ...
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KLAEIR
KLAAdvance
KLAFoundation
Orbotech
SPTS
Certified&Remanufactured
DefectInspection
Surfscan®Series
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Surfscan®Series
UnpatternedWaferDefectInspectionSystems
TheSurfscan® unpatternedwaferinspectionsystemsidentifydefectsandsurfacequalityissuesthataffecttheperformanceandreliabilityofsemiconductordevices.ItsupportsIC,OEM,materialsandsubstratemanufacturingbyqualifyingandmonitoringtools,processesandmaterials,byquicklyisolatingsurfacedefects.
ApplicationsProcessqualification,Toolqualification,Toolmonitoring,Outgoingwaferqualitycontrol,Incomingwaferqualitycontrol,Resistandscannerqualification,Processdebug.RelatedProductsSurfscanSP2XP:
Unpatternedwaferinspectionsystemtargetedfortechnologies≥45nmdesignnode.
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SurfscanSP2:
Unpatternedwaferinspectionsystemtargetedfortechnologies≥65nmdesignnode.
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SurfscanSP1DLSPro:
Unpatternedwaferinspectionsystemtargetedfortechnologies≥90nmdesignnode.
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SurfscanSP1TBIPro:
Unpatternedwaferinspectionsystemtargetedfortechnologies≥130nmdesignnode.
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2835,2367
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2835,2367
BroadbandPlasmaPatternedWaferDefectInspectionSystems
The2835and2367broadbandplasmadefectinspectionsystemsprovideindustryprovenperformanceforopticalpatterneddefectinspection,enablingdiscoveryandmonitoringofyield-criticaldefectson≥45nmlogic,memoryandspecialtydevices.Eachmodelisuniquelyequippedwithselectablewavelengthillumination,imagingpixels,opticmodesandadvancedalgorithmsfornoisesuppressionanddefectseparationtoprovidecost-effective,inlineinspectioncontrolforyourmostcriticallevels.
ApplicationsInlinedefectdiscoveryandmonitoring,Hotspotdiscovery,Engineeringanalysis,Processwindowqual,Photocellmonitoring.RelatedProducts2835:
PatternedwaferinspectionsystemwithbroadbandDUV-UV-Visiblespectrumtargetedfor≥45nmdesignnodes.
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2367:
PatternedwaferinspectionsystemwithbroadbandUV-Visiblespectrumtargetedfor≥65nmdesignnodes.
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Puma™91xx
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Puma™91xx
LaserScanningPatternedWaferDefectInspectionSystems
ThePuma™9130and9150laserimaginginspectorscombineUVilluminationopticswithmultiplehighspeedimagingsensorstoofferarangeofopticalmodesforcriticaldefectdetectioninlineonpatterned,productionwafers.The91xxdelivershighsamplingrates,highthroughputandhighsensitivityenablingmoreeffectivecaptureandcontrolofyield-impactingdefectsoncriticalFrontend-of-line(FEOL)andBack-end-of-line(BEOL)layers.The91xxcomplementstheKLA2367full-spectrumUV/visibleand2835DUV/UV/visiblebrightfieldinspectorsforacompletemixandmatchpatternedwaferinspectionstrategy.
ApplicationsLinemonitor,Toolmonitor,Toolqualification,Filmdefectivity,Photocellmonitoring,ADI.RelatedProductsPuma9150:
PatternedwaferinspectionwithUVilluminationlaser-basedimagingtechnology.The9150extendsthe9130withtheadditionofnormalillumination,enhanceddataratesandnewopticalmodesforimprovedcapability.
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Puma9130:
PatternedwaferinspectionwithUVilluminationlaser-basedimagingtechnology.
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eDR™-5210
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eDR™-5210
e-BeamWaferDefectReviewandClassificationSystem
TheeDR™-5210electron-beam(e-beam)waferdefectreviewandwaferclassificationsystemcaptureshighresolutionimagesofdefects,producinganaccuraterepresentationofthedefectpopulationonawafer.TheeDRprovidesuniquelinkagetoKLAinspectorsforfasteryieldlearningduringICandwafermanufacturing.
ApplicationsDefectimaging,Automaticinlinedefectclassificationandperformancemanagement,Barewaferoutgoingandincomingqualitycontrol,Waferdispositioning,Hotspotdiscovery,Defectdiscovery,Processwindowdiscovery,Processwindowqualification,Beveledgereview.eDR®isaregisteredtrademarkofKLACorporation.
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Certified&Remanufactured
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Metrology
Metrology
SubstrateManufacturing
SubstrateManufacturing
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